Electron beam lithography with feedback using in situ self-developed resist

Technique for preparation of precise wafer cross sections and applications to electron beam lithography of poly„methylmethacrylate... resist

We have developed a method of cross-sectioning silicon wafers with high placement precision. It is implemented by using optical lithography and deep plasma high aspect ratio etching of a thin line, which is used as the breaking axis. This technique is then applied to cross-sectional scanning electron microscopy ~SEM! studies of sub-50 nm electron beam lithography in ~poly!methylmethacrylate res...

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography

Computer Simulation of Electron and Ion Beam Lithography of Nanostructures

In this paper a review of the authors results on mathematical modeling of the processes at electron or ion beam lithography of nanostructures is presented. Our Monte Carlo simulation tools for electron and ion exposures are successfully applied for the energy deposition calculation at electron or ion lithography of resist layers. At ion lithography electronic energy losses of penetrating electr...

Electron Beam Lithography on Irregular Surface Using Grafted PMMA Monolayer as Resist

DOI: 10.1002/admi.201600780 coat uniform electron beam resist on nonflat surfaces. Unlike spin-coating technique, spray coating method,[14] and Langmuir–Blodgett (LB) technique[15] may be employed to coat resist on nonplanar surfaces, but they have several limitations including sample should be free from sharp corners or edges for spray coating, and very few materials are usable as e-beam resis...

Fabrication of cantilever based mass sensors integrated with CMOS using direct write laser lithography on resist

A CMOS compatible direct write laser lithography technique has been developed for cantilever fabrication on pre-fabricated standard CMOS. We have developed cantilever based sensors for mass measurements in vacuum and air. The cantilever is actuated into lateral vibration by electrostatic excitation and the resonant frequency is detected by capacitive readout. The device is integrated on standar...